How Megasonic Cleaning Technology Improves Silicon Wafer Yields

Silicon wafer cleaning is an essential and critical part of semiconductor manufacturing. Particles must be removed from the wafer substrate during processing without damaging the delicate microcircuit structures. This will result in defective semiconductor components or low-quality output.

In megasonic cleaning systems, a megasonic frequency generator creates high-frequency sound waves in a liquid via a transducer which is submerged in a cleaning tank. The sound waves are compression waves that appear either in high-frequency peaks or low-frequency troughs. The low-frequency troughs produce cavitation bubbles which break down in high-pressure peaks. These bubbles provide the cleaning action for removing contaminants that are on the surface of the wafer. Low ultrasonic frequencies (20 to 40 kHz) produce large, high-energy bubbles which clean more robust surfaces, while high ultrasonic frequencies produce smaller bubbles, ideal for cleaning delicate components.

The megasonic cleaning technology used in the process will effectively remove sub-micron particles and contaminants without damaging or altering the wafer’s surface. Selecting the right frequencies and power levels is essential for effective cleaning results. Modutek incorporates the Kaijo Corporation high-frequency Megasonic Cleaning technology into its wet bench process equipment.

Kaijo’s megasonic generators in Modutek’s wet benches operate at 950 kHz in the standard version. Other frequencies are also available for a variety of cleaning applications. Modutek has included Kaijo’s megasonic cleaning system in both direct and indirect bath designs. Semiconductor facilities can use Modutek’s wet benches which incorporate the use megasonic cleaning technology to effectively improve yields. Benefits of using the technology include faster cleaning time, higher cleaning effectiveness, and lower use of costly chemicals and their disposal.

If you have questions about using Modutek’s wet bench stations which incorporate megasonic cleaning technology, call Modutek or email Modutek@modutek.com. For more details read the the full-length article entitled “How Megasonic Cleaning Technology Improves Silicon Wafer Yields.”

Leave a Reply

Fill in your details below or click an icon to log in:

WordPress.com Logo

You are commenting using your WordPress.com account. Log Out /  Change )

Google photo

You are commenting using your Google account. Log Out /  Change )

Twitter picture

You are commenting using your Twitter account. Log Out /  Change )

Facebook photo

You are commenting using your Facebook account. Log Out /  Change )

Connecting to %s