The semiconductor manufacturing and research industries use wet benches to produce silicon wafers that need to undergo cleaning and etching.
The wet bench equipment needs to be flexible configured to meet certain manufacturing processes. Ideally, it should be designed for both acid and solvent cleaning applications.
Usual processes used for wafer processing equipment include KOH Etching, Buffer Oxide Etching (BOE), RCA Clean, plating and Megasonic cleaning. The equipment can also be tailored to meet the customer’s specific process requirements. Customers can choose three different types of wet benches according to the budget framework and the process:
- Fully automated stations – This offers excellent consistency of process steps and improved output quality. It is designed to precisely control the use and chemicals and process times. This leads to minimized wastes which in means in saving money as well as easier compliance with environmental regulations. Automated stations also help to reduce operator errors.
- Semi-automated stations – This offers some features of the fully automated stations, at a much lower cost. It has servo-controlled robots which allow operators to precisely control chemical use and process times. It also has user-friendly controls.
- Manual stations – This offers no robotics but has the same high quality process equipment as the fully and semi-automated stations.
All of Modutek’s wafer processing equipment stations are built with white propylene construction with wiring to NFPA 70 and 79, and have safety features. They can be ordered as standard units or can be customized to meet certain processing, etching or cleaning applications.
Our full article “Tips on Selecting Wafer Processing Equipment for Your Application” goes into more detail. If you have questions after reading this, please contact Modutek at Modutek@Modutek.com.